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1. Identity statement
Reference TypeJournal Article
Sitemtc-m21c.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier8JMKD3MGP3W34R/43L97H8
Repositorysid.inpe.br/mtc-m21c/2020/11.23.12.01   (restricted access)
Last Update2020:11.23.12.01.23 (UTC) simone
Metadata Repositorysid.inpe.br/mtc-m21c/2020/11.23.12.01.23
Metadata Last Update2022:01.04.01.35.38 (UTC) administrator
DOI10.1109/TPS.2020.3032119
ISSN0093-3813
Citation KeyUedaRYSALPR:2020:PITrSS
TitlePIII treatment of SS samples using a current-controlled high-voltage pulser
Year2020
MonthNov.
Access Date2024, May 19
Type of Workjournal article
Secondary TypePRE PI
Number of Files1
Size2291 KiB
2. Context
Author1 Ueda, Mário
2 Rossi, José Osvaldo
3 Yamasaki, Fernanda Sayuri
4 Silva Júnior, Ataide Ribeiro
5 Araújo, Michel Felipe
6 Lepienski, Carlos Maurício
7 Pichon, Luc
8 Reuther, H.
Resume Identifier1 8JMKD3MGP5W/3C9JHSB
2 8JMKD3MGP5W/3C9JHJ5
ORCID1
2 0000-0002-1421-163X
3 0000-0002-7734-769X
Group1 LABAP-COCTE-INPE-MCTIC-GOV-BR
2 LABAP-COCTE-INPE-MCTIC-GOV-BR
3 LABAP-COCTE-INPE-MCTIC-GOV-BR
Affiliation1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Federal de São Paulo (IFSP)
5 Instituto Nacional de Pesquisas Espaciais (INPE)
6 Universidade federal do Paraná (UFPR)
7 University of Poitiers
8 Institute of Ion Beam Physics and Materials Research
Author e-Mail Address1
2 jose.rossi@inpe.br
JournalIEEE Transactions on Plasma Science
Volume48
Number11
Pages3800-3806
Secondary MarkA1_ENGENHARIAS_IV B1_INTERDISCIPLINAR B1_ENGENHARIAS_III B1_ENGENHARIAS_II B3_MATERIAIS B3_ASTRONOMIA_/_FÍSICA
History (UTC)2020-11-23 12:01:23 :: simone -> administrator ::
2020-11-23 12:01:24 :: administrator -> simone :: 2020
2020-11-23 12:09:05 :: simone -> administrator :: 2020
2022-01-04 01:35:38 :: administrator -> simone :: 2020
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
Version Typepublisher
KeywordsPlasma applications
plasma materialsprocessing applications
pulse transformers
pulsed power systems
AbstractPlasma immersion ion implantation (PIII) was conducted in a large volume chamber with a current-controlled highvoltage pulser, to test the vacuum, plasma, and PIII conditions, in a preparation for the treatments of large workpieces or the batch-processing mode. For that purpose, a rugged high-power pulser (10 kW average) based on solid-state moderate voltage pulse system (1 kV) was coupled to a high-voltage transformer (1:22) to feed different loaded sample supports placed in different positions inside the chamber. It was found that the plasma, when produced by a hot filament enhanced glow discharge source, is not uniformly distributed in the chamber but despite that, implantation doses are locally uniform within 10% for 1015-cm distances, along with the supports. Stainless steel 304 (SS304) -type samples were successfully treated with nitrogen PIII and different tests showed improvements on their mechanical and tribological properties.
AreaFISPLASMA
Arrangementurlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > PIII treatment of...
doc Directory Contentaccess
source Directory Contentthere are no files
agreement Directory Content
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4. Conditions of access and use
Languageen
Target Fileueda_piii.pdf
User Groupsimone
Reader Groupadministrator
simone
Visibilityshown
Archiving Policydenypublisher allowfinaldraft
Read Permissiondeny from all and allow from 150.163
Update Permissionnot transferred
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ET2RFS
Citing Item Listsid.inpe.br/mtc-m21/2012/07.13.14.52.24 21
sid.inpe.br/bibdigital/2013/09.25.21.49 2
sid.inpe.br/mtc-m21/2012/07.13.14.56.06 1
DisseminationWEBSCI; PORTALCAPES; COMPENDEX; IEEEXplore.
Host Collectionurlib.net/www/2017/11.22.19.04
6. Notes
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